- Country: USA
- Summary: Interference Lithography Stage System
- UST Ref No: 124596004
- Deadline: 25 Aug 2025
- Financier: Self Financed
- Purchaser Ownership: Government
- Tender Value: Refer Document
- Notice Type: Tender
- Document Ref. No.: BZ-2025-11
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- Description:
- Description
Lawrence Berkeley National Laboratory is conducting market research to identify sources that possess the capabilities and experience necessary to deliver an Interference Lithography Stage System for the Center for X-Ray Optics.
The stage system consists of two separate stage assemblies: one will carry standard size silicon wafers, the other will carry a tray of optical gratings. Light will pass through the gratings from above and reach the wafer, which will require the grating mount to be offset from the stage body or to have an open frame stage assembly.
The stage system will be enclosed in a vacuum chamber with an operating pressure of 1E-7 Torr. The stages must be built to withstand the vacuum environment with low particle generation and also have minimal outgassing when the chamber is at operating pressure.
Please see the attached RFI documents for preliminary specifications and submission instructions. - Documents:
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CLICK HERE TO LOGINInterference Lithography Stage System - USA Tender
The ENERGY, DEPARTMENT OF, a Government sector organization in USA, has announced a new tender for Interference Lithography Stage System. This tender is published on USARFP under UST Ref No: 124596004 and is categorized as a Tender. Interested and eligible suppliers are invited to participate by reviewing the tender documents and submitting their bids before the deadline on 2025-08-25.
The estimated tender value is Refer Document, and full details, including technical specifications and submission requirements, are provided in the official tender documents. Ensure all submissions meet the criteria outlined to be considered for evaluation.
